abstract |
(57) [Problem] A resistor, a phosphor, and a partition wall which can be developed with water, a dilute aqueous alkali solution or an organic solvent, have good pattern accuracy, have little residue of organic matter after heating and baking, and have excellent adhesion. And a resin composition for a conductor pattern, a film, and a cured product thereof. A photopolymerizable resin compound (A) and / or a non-reactive resin (A '), a diluent (B), a photopolymerization initiator (C), and a metal powder having an ethylenically unsaturated bond on its surface A resin composition, a film and a cured product thereof, comprising one or more (F) selected from a group consisting of a metal oxide and a glass. |