| abstract |
[PROBLEMS] To provide a liquid crystal display device in which cracks and peeling of a pixel electrode are prevented, and a malfunction of a pixel electrode due to the influence of impurities and an influence of light interference are prevented. A silicon nitride film is formed on a thin film transistor. 15 is formed, an acrylic resin film 16 of an organic insulating film is formed, a contact hole 17 is formed in the acrylic resin film 16, and an oxynitride A silicon film 18 is formed. Pixel electrode 19 Is electrically connected to the drain electrode 5 of the thin film transistor 14 through the surface of the silicon oxynitride film 18 on the surface of the contact hole 17 to form an active matrix array substrate 20. In silicon oxide, the conductivity of impurities, metal ions and water in the organic film is good, which affects the malfunction of the pixel electrode. In silicon nitride, the refractive index of the organic insulating film between the polyimide resin film and the ITO pixel electrode is high. Are too different, light interference occurs, and these problems do not occur with silicon oxynitride. |