http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10333341-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 1997-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a314ce10e6ebfe39c33a3b695f1be2d |
| publicationDate | 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10333341-A |
| titleOfInvention | Method of forming resist pattern and method of manufacturing semiconductor device |
| abstract | (57) Abstract: In a photolithography technique using a chemically amplified resist, a resist pattern forming method for forming a pattern below the resolution limit of an exposure apparatus and a method for manufacturing a semiconductor device are provided. An acid generator that generates an acid by light irradiation, A step of applying a photoresist having a unit structure in which a protecting group is dissociated by an acid to form a photoresist film (Steps S11 to S12), and a step of processing the photoresist film into a predetermined pattern (Steps S13 to S16) Exposing the photoresist film to generate an acid in the photoresist film (step S17); dissociating the protective group with the acid, and reacting the unit structure with the dissociated protective group with a predetermined fluid. To change the dimensions of the patterned photoresist film (step S18) Thus, a resist pattern is formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101207046-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009212404-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6270929-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7008832-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6210868-B1 |
| priorityDate | 1997-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.