http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10326017-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 1998-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8e054927dda4762faf969d5e11a8f87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
| publicationDate | 1998-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10326017-A |
| titleOfInvention | Pattern formation method |
| abstract | (57) [Abstract] (With correction) [Solution] A chemically amplified positive resist material is applied on a substrate to a uniform thickness to form a resist film, the resist film is exposed, and post-exposure bake is performed. When developing with a developer to form a positive pattern, as a base polymer, a mixture of two or more base polymers having different acid labile groups or two different acid labile groups in one molecule are used. By using the base polymer having the above and adjusting the types of the acid labile groups different from each other and the content in the base polymer, the average dissolution rate from the resist film surface to the substrate direction up to 500 ° is 100 ° / sec. And the average of the dissolution rate of 1000 ° from the substrate surface to the resist film surface direction is 100 ° / sec. The exposure amount E2 was adjusted so that −0.2 <(E2−E1) / E2 <0.2. [Effect] A pattern having a high resolution and a high depth of focus can be formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6921621-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003107708-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010152343-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004151486-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011013581-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8877423-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011002102-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4595275-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002099090-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7150956-B2 |
| priorityDate | 1997-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 567.