| abstract |
[PROBLEMS] To provide a chemically amplified resist composition having excellent sensitivity and resolution and suitable for forming a positive image. A photosensitive composition containing a high molecular polymer having a monomer unit represented by the following formula (1) or (2), a compound that reduces the solubility of the polymer in an alkaline solution, and a hydrophilic group: A polyurethane resin having A photosensitive composition containing at least one selected from a polyester resin having a hydrophilic group and a polyamide resin having a hydrophilic group, and a compound that reduces the solubility of the resin in an alkaline solution. [In the formula, X 1 and X 2 represent a divalent linking group, Y represents a hydrogen or a carboxyl group, Z represents a hydrogen, an alkyl group, or a carboxyl group, R represents a hydrogen, an aliphatic group, or an aromatic group; And n represents 0 or 1. ] |