http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10302652-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f6f175f2c8eac40363953838045e7c40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 |
| filingDate | 1998-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea7095fbe9bf30bb0137a12f1e6a839c |
| publicationDate | 1998-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10302652-A |
| titleOfInvention | Plasma display panel and method of manufacturing the same |
| abstract | (57) [Summary] (with correction) [Problem] To improve the resolution of a completed panel. A lower substrate, a plurality of partitions formed of photosensitive glass thereon, thin-film electrodes formed on the entire surface of the partitions and the lower substrate, and a phosphor film formed thereon. The method comprises the steps of applying a photosensitive paste to a uniform thickness on one of two substrates bonded in parallel and baking to form a photosensitive glass layer. 3 and forming a photoresist layer on the photosensitive glass layer, Providing a pattern mask on the entire surface and exposing and developing to remove unnecessary portions to form partitions S104-S 106, a thin film electrode layer is formed to a predetermined thickness on the photoresist between the partition walls, and a thin film electrode is formed by removing unnecessary portions of the photoresist and the thin film electrode layer remaining on the partition walls. And forming a phosphor film on the entire surface of the thin film electrode. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6692885-B2 |
| priorityDate | 1997-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.