http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10282687-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 1997-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b484b2e793f5b7ee326201bb566134c1 |
| publicationDate | 1998-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10282687-A |
| titleOfInvention | Photosensitive resin developer, developing method and method for manufacturing color filter |
| abstract | (57) [Abstract] [Purpose] A photosensitive resin developer and development that has high resolution without film peeling or film residue, and has a wide allowable development time range, so that development uniformity is high and global unevenness does not occur. The present invention provides a method, and provides a high quality color filter using such a developing solution and a developing method. SOLUTION: A photosensitive resin developer having a contact angle to a photosensitive resin surface of 25 ° or more and 40 ° or less, a developing method using the photosensitive resin development, and a photosensitive resin developer described above when forming a black matrix. A method for producing a color filter, characterized by using: |
| priorityDate | 1997-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.