abstract |
(57) [Summary] [PROBLEMS] As a chemically amplified resist, the resolution of contact holes is particularly excellent, and the transparency to radiation is high. Provided is a radiation-sensitive resin composition having excellent dry etching resistance, pattern shape, sensitivity, resolution, and the like. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin having an alicyclic skeleton in a main chain and / or a side chain, (B1) The transmittance for radiation having a wavelength of 100 to 300 nm is 60. % / Μm or more, or (B2) a compound represented by the following general formula (1) having a molecular weight of 1,000 or less, and (C) a radiation-sensitive acid generator, and the component (A) And at least one of the component (B1) or (B2) contains an acid-cleavable group. Embedded image Wherein R 1 and R 2 are a hydrogen atom or an acid-cleavable group, Z represents a group having a cyclic hydrocarbon structure in which the total number of ring-constituting carbon atoms is 7 to 25, and 0 ≦ a ≦ 6, 0 ≦ b ≦ 6, 1 ≦ (A + b) is satisfied. ] |