http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10253552-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-28
filingDate 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55d56d25357f016281df5843fb84de15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_102d02095c78580925c3f2ee7342c417
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_549bab29a8afe46ec2b81a360af1838c
publicationDate 1998-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10253552-A
titleOfInvention Crystal defect analysis method for single crystal sample and sample holder
abstract (57) [Summary] [Problem] Even when the diameter of an opening of a sample holder and the diameter of a single crystal sample are close to each other, no scattered X-rays are generated and an accurate X An object of the present invention is to provide a method for analyzing a crystal defect of a single crystal sample and a sample holder capable of obtaining a line topograph. SOLUTION: By performing an X-ray topographic analysis method using a sample holder made of a material whose intensity of scattered X-rays is less than the sensitivity of an X-ray film, there is no scattering image generated in a conventional sample holder. And the efficiency of the measurement operation was significantly improved by eliminating the X-ray topograph re-measurement operation.
priorityDate 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.