http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10242143-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
filingDate 1997-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baff81ccbaa0d5563a782961262da7d8
publicationDate 1998-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10242143-A
titleOfInvention Semiconductor device, method of manufacturing semiconductor device, and method of forming insulating film of semiconductor device
abstract (57) [Problem] To reduce the relative permittivity of an insulating film in manufacturing a semiconductor device. SOLUTION: An aluminum wiring 2 is arranged on a silicon substrate 1, and a plasma oxide film 3 is deposited. Thereafter, the HMO film 4 is deposited by a plasma CVD method using a mixed gas of silane, methylsilane and hydrogen peroxide or a mixed gas of methylsilane and hydrogen peroxide. The HMO film 4 A plasma oxide film 5 is formed thereon.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6815373-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8084294-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006088015-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001168193-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6800571-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006088015-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4900239-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6593655-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022230944-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6531398-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009542011-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7153787-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6936309-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011071555-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7902549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010103495-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6159871-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7060323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013074237-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6943127-B2
priorityDate 1997-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID81714
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425252065
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID142154
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12052
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393705
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544406
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544403
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733498
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393636
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414869995
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID137730
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393356
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415836787
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70435
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID68337
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70434
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407155265
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23953
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458434260
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66185
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415740157
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 60.