http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10239864-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1997-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b484b2e793f5b7ee326201bb566134c1
publicationDate 1998-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10239864-A
titleOfInvention Method of forming black resist pattern and method of manufacturing color filter
abstract [Problem] To provide a method of forming a black resist pattern suitable for manufacturing a color filter having no black defect known as one of the pixel defects and a method of manufacturing a color filter using the forming method. I do. The method includes forming a black resist pattern by applying a photopolymerizable composition in which a black material is dispersed on a transparent substrate, and then performing each of heat drying, image exposure, development, and thermosetting. After the end of development and before thermosetting, After at least the black resist pattern forming surface of the substrate is treated with a cleaning solution containing an anionic surfactant, the substrate is washed with water. Then, using the respective photopolymerizable compositions in which the red, green, and blue materials are respectively dispersed, coating, heating and drying, image exposure, Each process of development and thermosetting is performed to form a pixel image of each color.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005115173-A
priorityDate 1996-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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