| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 |
| filingDate |
1997-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2bdecbf196b74f183e181dc792e3496
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d45fb3eb5dd87bb57987b10422ac4c6 |
| publicationDate |
1998-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10229043-A |
| titleOfInvention |
X-ray mask blank, method for manufacturing the same, and method for manufacturing X-ray mask |
| abstract |
[PROBLEMS] To provide an X-ray mask blank and an X-ray mask capable of producing an X-ray mask having extremely high positional accuracy, while maintaining a high etching selectivity while maintaining an extremely low stress. A manufacturing method is provided. SOLUTION: An X-ray transmitting film 12 is provided on a substrate 11, An X-ray mask blank having an X-ray absorber film 13 on the X-ray transmission film 12, wherein on the X-ray absorber film 13, An etching mask layer made of a material containing chromium, carbon, and / or nitrogen is provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4695964-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011003898-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8395772-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007133098-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010009001-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6696205-B2 |
| priorityDate |
1996-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |