http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10228111-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1997-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 1998-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10228111-A |
| titleOfInvention | Positive photoresist composition |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photoresist composition which is sufficiently suitable especially for light in a wavelength region of 170 nm to 220 nm, is highly sensitive to light, and has excellent storage stability. It is in. SOLUTION: A positive photoresist composition containing a resin having a specific ester group in the molecule and a compound capable of generating an acid upon irradiation with actinic rays or radiation. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000089464-A |
| priorityDate | 1997-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.