http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10228108-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1997-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35caa566cc9fa811ad0fde038dbf50e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef0cacd9d4c8c83934baf8653b0a6ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_961516b24aac50a4fd1ebe365fcdf2e5 |
| publicationDate | 1998-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10228108-A |
| titleOfInvention | Photosensitive composition, photosensitive material, method for producing relief pattern and method for producing polyimide pattern |
| abstract | (57) [Summary] (Modified) [PROBLEMS] To provide a photosensitive composition, a photosensitive material, and a method for producing a polyimide pattern exhibiting excellent photosensitive characteristics and storage stability. SOLUTION: The photosensitive composition containing an organic sulfur compound, a titanocene compound represented by the following general formula (I) and an addition polymerizable compound, an organic sulfur compound, a titanocene represented by the following general formula (I) A photosensitive material comprising a compound, a polyamic acid, a compound having a carbon-carbon double bond capable of being dimerized or polymerized by actinic radiation and an amino group or a group of a quaternized salt thereof, the photosensitive composition or the photosensitive material A method for producing a relief pattern by irradiating a coating film of a photosensitive material with actinic rays in a pattern and developing and removing unirradiated portions, and a method for producing a polyimide pattern by heating the relief pattern obtained by this production method. (Wherein, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 each independently represent a hydrogen atom, a halogen atom, an alkoxy group having 1 to 20 carbon atoms or a heterocyclic ring) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2019336-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008151915-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010279074-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2362155-A |
| priorityDate | 1997-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 222.