http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1022615-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-09
filingDate 1996-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3adaf16c2d210f82460ff79d9b2ac81b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11cdbb7c4e6cfe91668d85a3080ca02c
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_850b9ace9ab27baedf1e315db375cae0
publicationDate 1998-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1022615-A
titleOfInvention Substrate with transparent conductive film, method of manufacturing the same, and transparent touch panel using the same
abstract PROBLEM TO BE SOLVED: To provide a substrate with a transparent conductive film in which an ITO thin film obtained by calcining an indium compound and a tin compound is provided on a glass substrate, which has high total light transmittance and high resistance. It is another object of the present invention to realize a highly reliable substrate with a transparent conductive film having little change in transmittance and resistance value in a high-temperature and high-humidity environment. SOLUTION: An ITO thin film 12 obtained by firing an indium compound and a tin compound on a glass substrate 11 and having a thickness of less than 30 nm is provided, on which a protective film 13 made of silica is formed. The sheet resistance is 1k-1 Within the range of 0 kΩ / □ and the total light transmittance is 90% That is all.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011060617-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101091779-B1
priorityDate 1996-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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