| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1997-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45c252583cde8d06ccecefeda60d1649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 |
| publicationDate |
1998-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10221854-A |
| titleOfInvention |
Positive photoresist composition |
| abstract |
PROBLEM TO BE SOLVED: To provide an excellent chemically amplified positive photoresist composition which has a high resolution and does not generate a depression at the top of a pattern and forms a resist pattern having good adhesion to a substrate. Is to provide. SOLUTION: (a) In the alkali-soluble resin containing a phenolic hydroxyl group, 10% of the phenolic hydroxyl group A resin in which -80% is substituted with a group having a specific structure; A positive photoresist composition comprising (b) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (c) a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8080362-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7361446-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0028383-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001318464-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1467251-A1 |
| priorityDate |
1997-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |