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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
filingDate 1997-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd92c08229c283a0ed66b9e6f78ce32c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4261329831dc1f799f6b9f48d602ef18
publicationDate 1998-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10221846-A
titleOfInvention Method for producing photosensitive agent and positive photoresist composition containing this photosensitive agent
abstract PROBLEM TO BE SOLVED: To provide a method for producing a positive photoresist composition excellent in sensitivity and resolution of resist performance, particularly a photosensitive agent having high sensitivity and a large difference in alkali dissolution rate before and after exposure. And a high-resolution positive photoresist composition containing: A methylenetetra-p-cresol is provided. After 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride was subjected to an esterification reaction using dimethylacetamide as a solvent in the presence of triethylenediamine, the reaction solution was poured into an aqueous hydrochloric acid solution, and the resulting precipitate was filtered. Separately, a method for producing a photosensitive agent which is washed with water and dried, and a positive photoresist composition comprising the photosensitive agent and an alkali-soluble resin.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007017987-A
priorityDate 1997-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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