http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10209275-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
filingDate 1997-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_960fb33b026192088a1b8674cd7116f5
publicationDate 1998-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10209275-A
titleOfInvention Method for manufacturing semiconductor device
abstract (57) [Summary]nPROBLEM TO BE SOLVED: To reduce the occurrence of peeling on the surface of a base film while preventing it Enables the formation of a dielectric film to ensure electrical reliability and And to reduce the capacitance between wirings.nSOLUTION: Si which is a base film having a Si-O bond O Two SiO on the surface of the film 3 Two With lower relative permittivity than film 3 Prior to forming the mechanical low dielectric constant film 5, SiO Two Membrane 3 The deteriorated layer 4 is formed on the surface layer of. The formation of this altered layer 4 For example, SiO Two Break the Si—O bond in the surface layer of the film 3 Light or ions having a possible wavelength are converted to SiO Two Of membrane 3 This is done by irradiating the surface. Also, the low dielectric constant film 5 Prior to formation, SiO Two From the plasma on the surface of membrane 3 Even if an adhesion film made of the generated CF-based polymer is formed Good.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019049735-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004095865-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017157727-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107154369-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10424488-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003530692-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019049735-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002370059-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007036067-A
priorityDate 1997-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 26.