http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10203897-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-04 |
| filingDate | 1997-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aae7dbcfae186b24c5d3b243d98cbc6e |
| publicationDate | 1998-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10203897-A |
| titleOfInvention | Pretreatment method and thin film forming apparatus in thin film formation |
| abstract | (57) [Problem] To provide a pretreatment method of a base material for improving adhesion to the base material and a simple and low-cost thin film forming apparatus. A surface of a base material is irradiated with hydrogen ions. By the reduction reaction with the hydrogen ions, cleaning of impurities on the surface of the substrate 3 and the like is performed. Subsequently, the base material 3 is irradiated with dissociated carbon and carbon ions and dissociated hydrogen and hydrogen ions to form a diamond-like carbon (DLC) thin film 80. Further, a switching means for switching the gas introduced into the gas ion source of the DLC thin film forming apparatus for cleaning or for forming the DLC thin film is provided. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9598762-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004205016-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107527870-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107527870-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007092829-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102010048947-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I504766-B |
| priorityDate | 1997-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.