| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 |
| filingDate |
1997-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31ed0e7191632a5f9009755f39fe3f4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be4093e90b62a9e3dab9156d5aa9208c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d784695368287472b9a3125aa2aa1e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89cdc9619d7212792c3e3f99214878
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fb90da9118934a9d31f7e9137b7f878 |
| publicationDate |
1998-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10198026-A |
| titleOfInvention |
Photosensitive resin composition, photosensitive element using the same, and method for producing phosphor pattern using the same |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a phosphor pattern with high accuracy, a photosensitive element using the same, and a method for producing a phosphor pattern. SOLUTION: The content of sulfur or a compound containing sulfur (excluding phosphors) is 500 pp in terms of weight concentration in terms of sulfur alone. m, a photosensitive resin composition containing a phosphor that is less than m. A photosensitive element comprising a photosensitive resin composition layer composed of the photosensitive resin composition on a support film and (I) the uneven surface of a substrate for a plasma display panel having barrier ribs formed thereon, are provided with the photosensitive composition. A step of forming a photosensitive resin composition layer composed of a resin composition, (II) a step of irradiating the photosensitive resin composition layer with an actinic ray imagewise, (III) A phosphor pattern including a step of forming a pattern by selectively removing a photosensitive resin composition layer by development and a step of forming a phosphor pattern by removing unnecessary portions from the pattern by baking. Manufacturing method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0865067-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030048335-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6106992-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0865067-A2 |
| priorityDate |
1997-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |