http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10161314-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate | 1996-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5e6672706312d71bd3238d69567d229 |
publicationDate | 1998-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H10161314-A |
titleOfInvention | Photosensitive resin composition and photosensitive lithographic printing plate |
abstract | PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a lithographic printing plate having high sensitivity, excellent cleaner resistance, and having no residual ball-point pen ink after being removed. SOLUTION: On one surface of a support, light, actinic radiation, In a photosensitive resin composition containing a compound which generates an acid or a radical by an electron beam, the photosensitive resin layer contains a vinyl polymer containing at least 75 mol% of a structural unit containing a cyclic hydrocarbon group. A polymer whose structural unit containing a cyclic hydrocarbon group is at least one selected from the following formulas (1), (2) and (3). (In the formula, R 1 to R 12 each represent a hydrogen atom, an alkyl group, an aryl group, an alkylene group, a cycloalkyl group, a cycloalkylene group, an aralkyl group, an arylene group, or an aralkylene group.) |
priorityDate | 1996-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 373.