http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10161305-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1996-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9df332f02eed3f0dcdb9972eb7bda4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9608ab9e3cc60c8eb87832680e0ab899 |
| publicationDate | 1998-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10161305-A |
| titleOfInvention | Positive resist composition |
| abstract | (57) [Problem] To provide a resist composition excellent in sensitivity, resolution, residual film ratio, pattern shape, exposure margin, and focus margin. (A) an alkali-soluble phenol resin, (B) A positive resist composition containing a quinonediazidesulfonic acid ester-based photosensitizer of a polyhydroxy compound which is a kind of limonene derivative. |
| priorityDate | 1996-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 265.