abstract |
(57) [Problem] To provide a cerium oxide abrasive for polishing a surface to be polished such as an SiO 2 insulating film without damage. SOLUTION: SiO 2 produced by a TEOS-CVD method The maximum particle diameter of the slurry in which the cerium oxide particles are dispersed in the medium is 1000 nm. Polish with the following slurry abrasive. |