http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10148938-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 1996-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_824072a2cd2e301d720dc1bad9835989 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d022b7100894971a5869a936724688a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e03ec4b8fa7ff591a364fbc9841dd25f |
| publicationDate | 1998-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10148938-A |
| titleOfInvention | Photosensitive film for precision metal processing and pattern manufacturing method using the same |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive film for metal precision processing excellent in adhesion to a base metal (particularly an alloy containing iron), etching resistance and chemical resistance of the photosensitive film. And a pattern manufacturing method using the same. SOLUTION: A) a binder polymer containing a carboxyl group, (B) a photopolymerization initiator, (C) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in a molecule, and (D) An isocyanate compound represented by the general formula I (wherein R 1 represents an m-valent organic group; Represents an integer of 1 to 6. ) And at least one blocking agent selected from diketones, oximes, phenols, alkanols and caprolactams which can react with the photosensitive resin containing a blocked isocyanate compound represented by the general formula II Photosensitive film for metal precision processing formed by forming a photosensitive layer composed of a composition on a support And a pattern manufacturing method using the same. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008029706-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001305726-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010041785-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002174892-A |
| priorityDate | 1996-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.