| abstract |
(57) [PROBLEMS] To provide a pattern inspection method and apparatus which enables high-speed die-to-database inspection with respect to defect inspection of a fine pattern formed on a reticle, mask or wafer. SOLUTION: A copying step of copying design data to a recording device, and creating index data indicating which part of the design pattern data is recorded in the recording device, and creating index data for recording in the recording device Process, an imaging step of imaging the actual pattern on the stage and creating actual image data, and based on the position on the actual pattern, A reading step of reading design data through the index data, a design image data creation step of creating design image data based on the read design data, and comparing the actual image data with the design image data; Detecting a defect. |