http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10132653-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3b275afa0850f4e61db127b41613765 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J5-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J1-02 |
| filingDate | 1996-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25778bfda10510a3f4734308b23fe361 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ddeff5077bbe7db1b0b5e01a7d350b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0fdcc3bbc90e8c7ed51e514da61153d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_439f5a9aa2cd22c7e3d1fa609c6cef99 |
| publicationDate | 1998-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10132653-A |
| titleOfInvention | Manufacturing method of thermal infrared sensor |
| abstract | (57) [Problem] A method of returning a metal film oxidized during a process or a metal oxide film having an increased oxidation number to the original electrical characteristics with a protective film or the like, or a change in a temperature coefficient of resistance. Provided is a method for controlling only the specific resistance of the film without performing the above operation. SOLUTION: A sample wafer 1 on which a sensor has been formed is placed on a sample holder 2 in a vacuum vessel 3, and a heat treatment is performed on the sample wafer 1 at a desired temperature in a reducing atmosphere containing hydrogen gas. For the reducing atmosphere, introduce a reducing gas consisting of a mixed gas of argon and hydrogen into a vacuum-evacuated container, or enclose a thin film in a diffusion furnace at normal pressure and flow a certain amount of reducing gas consisting of hydrogen gas. Can be used as a reducing atmosphere. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007225532-A |
| priorityDate | 1996-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.