http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10125639-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fc0a00eab3a757e8324b1e887d7ba97 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 1997-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e26c5646a1bd3425398f84e1ba39c084 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55be9c9f7e512861cb52d249daeba079 |
| publicationDate | 1998-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10125639-A |
| titleOfInvention | Polishing method for semiconductor wafer |
| abstract | (57) Abstract: Chemical mechanical polishing (CMP) is a technique known in the art of semiconductor manufacturing and is used to improve planarity of upper layers of wafers and to determine conductive connections. In this CMP, New oxidizing / etching reagent that reduces metal contamination, prevents contamination of CMP equipment, contains no mobile ions, is safe and easy to circulate, cheap, environmentally safe, easily disposable, and stable colloidal suspension Is desired. A method of chemical / mechanical polishing (CMP) using a slurry (22). The slurry (22) includes one or more ammonium salts (eg, ammonium nitrate (NH4NO3)) as an oxidizing / etching species inherent in the slurry (22). The slurry (22) is used to polish the metal layer (14), where the ammonium salt does not suffer from slurry dispersion problems, is free of metal species, does not contain mobile ions such as potassium, and Environmentally safe. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100407296-B1 |
| priorityDate | 1996-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.