| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52a65b677bbedbe7bf090dd556a7cc43 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D129-04 |
| filingDate |
1996-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_299e860ab25e90db459aba4cc4b48a70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f052bdea3e343964b80e28511282bd5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a0ae048c0bd29cbd4728a10af713dd6 |
| publicationDate |
1998-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10120965-A |
| titleOfInvention |
Resin composition for silicon wafer protective film |
| abstract |
PROBLEM TO BE SOLVED: To develop a protective film for protecting a wafer surface during a chamfering step in silicon wafer production. SOLUTION: A resin composition for a silicon wafer protective film obtained by dissolving or dispersing polyvinyl alcohol having a saponification degree of 90 mol% or more in a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1122767-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1122767-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030045966-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0067305-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017217186-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110396332-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6534618-B1 |
| priorityDate |
1996-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |