| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-10 |
| filingDate |
1997-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6250bebc63b004ae54c84bd1f817db27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b240d23b2bafc2a9369b6da8f6c15fef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57ac23dff79ea84ec0f5149104275f52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8cdcb3666e03b4813f8a1a61316f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f9d2e9ecf672d19a5111262025e0eea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca931c90f24301208d4d3af7fd5e95fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12385bffcd4e345553edf0e4d2ec3cc |
| publicationDate |
1998-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10115924-A |
| titleOfInvention |
Photosensitive composition and pattern forming method using the same |
| abstract |
(57) [Summary] [PROBLEMS] To be able to apply exposure with short wavelength ultraviolet light or ionizing radiation, and to have excellent dry etching resistance. Provided is a photosensitive composition capable of increasing the tolerance in development with an aqueous alkali solution and capable of forming a fine pattern having a good cross-sectional shape. SOLUTION: Softening point 150 ° C or higher and average molecular weight 3000 A photosensitive composition containing an alkali-soluble polymer of up to 8000, a compound decomposed by an acid, and a compound generating an acid by irradiation with actinic radiation. |
| priorityDate |
1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |