| abstract |
(57) [Summary] (Corrected) [PROBLEMS] To provide an alkali-developable photopolymerizable resin laminate having good etching resistance, excellent resist line adhesiveness, and excellent carrier film adhesive strength. The photopolymerizable layer comprises (a) a carboxyl group-containing polymer, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, and (d) A photopolymerizable resin laminate comprising a photopolymerizable resin composition containing a compound represented by the following general formula (I). (N is an integer of 100 or less, and R is selected from hydrogen, an alkyl group, a hydroxyl group, a carboxyl group, an acryl group, a nitrile group, and an amide group) |