| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad78b36d08c20f06075145cc1caf3ac8 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1995-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd6a0dd0a09b8978407536823db30426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4ce984019da7485fd9b69d7805bf74d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a991baab08ab6fafd43444797409ebd |
| publicationDate |
1997-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0990633-A |
| titleOfInvention |
Negative photoresist composition |
| abstract |
(57) Abstract: A high-sensitivity negative photoresist composition capable of forming a good resist pattern with high resolution. A negative photoresist composition containing an alkali-soluble resin, an acid crosslinkable compound and a carbazolyltriazine compound represented by the following general formula (I). Embedded image |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9851635-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02075455-A1 |
| priorityDate |
1995-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |