| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e8ba6870e42607109689c74072ca5d3 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-889
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-06 |
| filingDate |
1995-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7313c0d8c5bb72f8872dab04b554ba5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_496900acd423d5a9f91405ce9c2f6935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44650558c287f974d8c8bfc6ca08c959 |
| publicationDate |
1997-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09873-A |
| titleOfInvention |
Hazardous gas purification method |
| abstract |
(57) [Summary] [Purpose] In the gas emitted from semiconductor manufacturing processes, Alternatively, basic gases such as ammonia and amines contained in the air due to leakage from a cylinder are efficiently removed. [Configuration] A gas containing a basic gas is mixed with copper oxide (I I) and a purifying agent in which a cobalt salt (II) is impregnated on a metal oxide containing manganese (IV) oxide as a main component. |
| priorityDate |
1995-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |