http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H097990-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4edd4e526605dbd18b513b4b30d19ab2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-08 |
| filingDate | 1995-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ca2d98e11e9da16002198d92b1edce1 |
| publicationDate | 1997-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H097990-A |
| titleOfInvention | Semiconductor wafer cleaning method |
| abstract | (57) [Summary] (Modified) [Purpose] To clean the semiconductor wafer before oxidation and to clean and remove metal ions adhering to the silicon oxide film, and to prevent re-adsorption of metal ions to the wafer after cleaning. [Structure] An organic functional group of a neutral ligand is bonded to a lone pair of metal ions separated from a semiconductor wafer to form a stable water-soluble complex. The adsorption rate is considerably low. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9905704-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100510440-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0030162-A1 |
| priorityDate | 1995-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.