http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0963473-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd0cdbc5c67cf4957ed83c89140748e
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-14
filingDate 1995-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3ec633f0461387b308ca6c583b4c6c3
publicationDate 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0963473-A
titleOfInvention Manufacturing method of shadow mask
abstract (57) Abstract: When a shadow mask used for a picture tube for a color display has a function that does not cause halation in an image displayed on the periphery of the picture tube, a shadow mask that does not have the function is provided. On the other hand, it is manufactured so as not to increase the man-hours, and not to cause the deterioration of strength or deformation. SOLUTION: After forming a resist layer on a conductor and patterning the same, after exposing the exposed conductor portion to electric iron plating, In the method of manufacturing a shadow mask for peeling off the electric iron plating film from the conductor, the distance (L) between the photolithographic mask surface and the resist is 10 μm when the resist is exposed. This is characterized in that the vertical section of the patterned resist is made into a trapezoidal shape by making the vertical section of the patterned resist into a trapezoidal shape by opening 1 mm from the above.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014326177-A1
priorityDate 1995-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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