http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0962003-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5929f2d6f4dba84be8dd3a8ba633db12 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02 |
filingDate | 1995-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_517b47190224c996b1c21fa933099906 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_604cdcc9d29f2a2e9b6312ea0b06e8bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_069da4b6c89de384bd909edd90716347 |
publicationDate | 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0962003-A |
titleOfInvention | Photopolymerizable resin composition |
abstract | (57) [PROBLEMS] To provide a photopolymerizable resin composition which has tack-free property and excellent resolution while maintaining good developability and which is particularly suitable as a solder resist. SOLUTION: A vinyl ester resin (C) obtained by reacting an epoxy compound (A) having at least two epoxy groups in one molecule with an unsaturated monobasic acid (B) is mixed with a dibasic acid. Anhydrous (D) and at least one or more tetrahydro-2,5-dioxo-3- in one molecule A photopolymerizable resin composition comprising a photopolymerizable resin (F) obtained by reacting with a furanyl group-containing tetrabasic acid anhydride (E) and a photopolymerization initiator (G). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004269779-A |
priorityDate | 1995-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 94.