http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H095995-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate | 1995-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d52973084e0f2ac6c3c3259bab00fd45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c54917e38a184836570ad42a086955b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f538ce9a8c4394832be9f1899623808d |
publicationDate | 1997-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H095995-A |
titleOfInvention | Processing method of photosensitive lithographic printing plate |
abstract | (57) Abstract: (a) A phenol-formaldehyde resin having a content of a component having three or more aromatic groups in one molecule of 90% by weight or more and a weight average molecular weight of 10,000 or more, And (b) a photosensitive lithographic printing plate having a photosensitive layer containing an o-naphthoquinonediazide sulfonic acid ester of a polyhydroxy compound having a weight average molecular weight of 2,000 or more, a saccharide, an oxime, a phenol and a fluorinated alcohol. A method for treating a photosensitive lithographic printing plate, which comprises developing with a developing solution containing at least one compound selected from the group consisting of, and having a pH value of the solution in the range of 10.0 to 12.7; The method for treating a photosensitive lithographic printing plate as described above, wherein the photosensitive layer further contains a cyclic acid anhydride; the replenishment control of the development replenisher is controlled based on the conductivity or impedance of the developer. Processing method of the photosensitive lithographic printing plate. [Effect] Development can be performed with a safe developing solution having a relatively low pH, and both developability and image strength (printing durability and chemical resistance) can be achieved. Further, since it is difficult to generate insoluble matter, it is suitable for processing using an automatic processor. |
priorityDate | 1995-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 472.