http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0945497-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_450febcfaba5b85b90f576bb462db0c6
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
filingDate 1995-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7bd2278914f3136f04fa70bba696e9e6
publicationDate 1997-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0945497-A
titleOfInvention Inductively coupled plasma CVD method and apparatus
abstract (57) An object of the present invention is to provide an inductively coupled plasma CVD method and apparatus capable of forming a film having a uniform thickness regardless of the plasma intensity. SOLUTION: When a high frequency is applied to a ring-shaped antenna 45 to generate plasma 43 and a vapor phase growth film is formed on the surface of a wafer 5 placed on a stage 7 in a reaction chamber 3, a rotating device is used. Rotates the stage 7 at high speed (3000r pm or more). As a result, the plasma 43 When the gas decomposed in step 1 is deposited on the wafer 5, the stage 7 on which the wafer 5 is placed rotates at a high speed, so that the film formation speed and the film formation uniformity are improved.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006040743-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016520950-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03060973-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4604591-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7547860-B2
priorityDate 1995-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518429
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61330

Total number of triples: 23.