| abstract |
(57) Abstract: A photosensitive resin composition comprising a copolymer resin composed of a phenol and an aralkyl compound as an essential alkali-soluble resin component, and a photoreactive component. The present invention provides a system for obtaining a register pattern which can be applied to not only g-line and i-line which have been used for general purposes but also excimer laser, particularly KrR excimer laser, and which has higher sensitivity and higher resolution. |