| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1996-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_362fadf841f39c02ff6fe2a8a6dfc5b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c47db514cab17ab1d0ac75bba760bc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94b0f0b51bade3ed1872b134032ad35c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3f52c36369747976f05808018167f46 |
| publicationDate |
1997-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09325495-A |
| titleOfInvention |
Negative radiation-sensitive resin composition |
| abstract |
(57) Abstract: There is provided a negative radiation-sensitive resin composition capable of forming a rectangular resist pattern with high resolution without developing residue during development, and having excellent sensitivity and dimensional fidelity. To do. The composition is (A) an alkali-soluble resin, (B) A radiation-sensitive acid generator and (C) a cross-linking agent composed of a urea derivative represented by N, N'-di (methoxyethoxymethyl) urea. |
| priorityDate |
1996-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |