| abstract |
(57) [PROBLEMS] To provide a positive photoresist composition having excellent sensitivity, resolution and heat resistance, and also excellent in depth of focus characteristics. SOLUTION: (A) alkali-soluble resin, (B) quinonediazide group-containing compound, and (C) bis (4-hydroxy-2,3,5-trimethylphenyl) -2-hydroxyphenylmethane, bis (4-hydroxy-). 2,3,5- Trimethylphenyl) -4-hydroxyphenylmethane, bis (4-hydroxy-2,3,5-trimethylphenyl) -3-hydroxyphenylmethane, bis (4- Hydroxy-2,3,5-trimethylphenyl) -3, Positive photoresist composition containing at least one selected from 4-dihydroxyphenylmethane and bis (4-hydroxy-2,3,5-trimethylphenyl) -4-hydroxy-3-methoxyphenylmethane. . |