| abstract |
(57) Abstract: [PROBLEMS] To provide a resin composition for a resistor, a conductor pattern and a phosphor pattern, which enables high density and delicate patterning. A photopolymerizable resin compound (A) and / or a non-reactive resin (A ′), a diluent (B), a photopolymerization initiator (C), an ultraviolet absorber (D) and / or a colorant. 1 selected from (E) and metal powder, metal oxide or glass Or a resin composition containing two or more kinds (F). |