http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09306870-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52 |
| filingDate | 1996-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_284e58b7c252b24db47e0b127ec953ce |
| publicationDate | 1997-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09306870-A |
| titleOfInvention | Method of forming barrier film |
| abstract | (57) Abstract: When a TiN thin film is deposited by a CVD method using a TiCl 4 / NH 3 gas system, Cl remains in the film. Further, since the TiN film obtained by the above CVD method has a columnar structure, it has a low barrier property against Cu. SOLUTION: A silicon substrate 2 having a trench formed in an oxide film is held on a substrate holding part 3, the inside of a chamber 1 is evacuated by a vacuum pump 17, and then the substrate 2 is heated by a substrate heating mechanism 4. After the substrate temperature is stabilized, NH 3 gas is supplied by opening the valve 12. Next, the valves 10 and 14 are opened, TiCl 4 and B 2 H 6 are supplied from the shower head 15, and a TiN film containing B is deposited in the trench of the substrate 2. Due to the strong reducing property of B 2 H 6 , TiN The residual chlorine concentration in the film was small, and as a result of adding B into the film, the film structure changed from columnar to amorphous, Sufficient barrier properties are exhibited even when copper is used as the wiring material. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6822299-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6791149-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6746952-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7067416-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6888252-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6824825-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03012860-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6696368-B2 |
| priorityDate | 1996-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.