| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-8592 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 |
| filingDate |
1996-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed73768e544ab50aa55355bda41f4918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b8923cc4c6ae2a34a20e8539738dbce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa69bca9004aa3d64ad636479bb2dcf |
| publicationDate |
1997-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09297400-A |
| titleOfInvention |
Negative-type photosensitive polymer resin composition, pattern forming method using the same, and electronic component |
| abstract |
(57) [PROBLEMS] To provide a negative photosensitive polymer resin composition capable of forming a fine polymer film pattern having excellent adhesion to a substrate or the like in a safe and simple process. A negative containing a thermosetting polymer resin precursor that is dehydrated and cyclized by heating to be cured, and a photosensitive thermosetting accelerator that generates a thermosetting acceleration ability (dehydration cyclization reaction acceleration ability) by light irradiation. Type photosensitive polymer resin composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020519561-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003084323-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018052873-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6596445-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018016787-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2012176822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BE-1012721-A5
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000068419-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012176822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2781794-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/ES-2170605-A1 |
| priorityDate |
1996-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |