http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09292704-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 1996-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbedb1a5039de4a4d2212c916ad759ca http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da7a5e710a365e31ce7f5bae9f3287d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9770ede2c7568ae0bf849c7ad5b9ddab |
publicationDate | 1997-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H09292704-A |
titleOfInvention | Pattern formation method |
abstract | (57) 【Abstract】 PROBLEM TO BE SOLVED: To use a chemically amplified resist composition having good sensitivity and to obtain excellent profile shape, dimensional fidelity and heat resistance, Also provided is a method for forming a resist pattern that is less affected by standing waves. SOLUTION: (A) 100 parts by weight of a film-forming component whose solubility in alkali is changed by the action of an acid, and (B) General formula (R is a non-reactive organic residue, R 1 is a lower alkyl group or a halogenated lower alkyl group, n is an integer of 1 to 3), and the molar extinction coefficient ε at i-line is 100 or less. An amount corresponding to 50 mJ / cm 2 or less in terms of the exposure amount required to form a resist pattern having a line and space of 0.8 μm, using a chemically amplified resist composition containing 5 to 20 parts by weight of the agent. Irradiate the i-line of A resist pattern is formed on the substrate. |
priorityDate | 1996-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 100.