| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
1996-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cc74e615587397ce26e57fea6d7e740
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0ec48cfc2ceedaa789fed92b153c468
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a472a1474ddc04cddcbfdf5993b2a752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41e578b3af3616638db4962fad2ba595 |
| publicationDate |
1997-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H09289208-A |
| titleOfInvention |
Method for patterning semiconductor surface |
| abstract |
(57) [Abstract] [PROBLEMS] To enable fine processing in a small number of steps without using an advanced exposure technique. Further, it is possible to easily perform fine processing of 50 nm or less. In a pattern forming method of a semiconductor surface for forming a periodic mask pattern on a Si substrate surface, a gallium adsorption surface 11 and a silicon surface 12 are periodically formed on a surface of a silicon substrate 10 having periodic atomic steps. Patterning method in which the silicon surface 12 and the silicon oxide 13 are periodically formed on the surface of the substrate along atomic steps after the oxygen gas is supplied to the surface of the substrate and oxygen gas is supplied to the surface of the substrate. |
| priorityDate |
1996-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |