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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-12
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filingDate 1996-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d1c849eea524ec8cc10b411adac0de5
publicationDate 1997-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09283856-A
titleOfInvention Semiconductor laser
abstract (57) [Abstract] [PROBLEMS] AlG having good temperature characteristics and easy to manufacture. Realize an aInP semiconductor laser. An n-type AlGaInP clad layer 3 is formed on an n-type GaAs substrate 1 with an n-type GaAs buffer layer 2 interposed therebetween. Active layer 5 made of undoped GaInP, p-type Al Al formed by stacking GaInP clad layer 8 and the like In a GaInP-based semiconductor laser, p-type AlGaIn Between the P clad layer 8 and the active layer 5 (Al xSL-a Ga 1-xSL + a ) 1-ySL-b In ySL + b P / (Al xSL + a Ga 1-xSL-a ) 1-ySL + b In ySL-b P strained superlattice layer (however, a is a positive number less than or equal to xSL, b is a positive number less than or equal to ySL) 7 To increase the effective hetero barrier between the p-type AlGaInP cladding layer 8 and the active layer 5.
priorityDate 1996-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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