| abstract |
(57) [Summary] (Modified) SOLUTION: A di- or triphenyl monoterpene hydrocarbon derivative represented by the following general formula (1). (In the formula, X represents a divalent or trivalent monoterpene hydrocarbon group, R 1 to R 3 are each independently a hydrogen atom, a linear or branched alkyl group, or the like. R 4 is hydrogen. An atom or an acid labile group, but at least one of R 4 is an acid labile group, n is an integer of 1 to 5, j, k and m are 0 to 4 respectively. And satisfy n + j + k + m = 5. p is 2 or 3. [Effect] The compound of formula (1) is sensitive to high energy rays such as deep ultraviolet rays, electron beams, and X-rays, particularly KrF excimer laser, and has a high sensitivity by compounding it with a chemically amplified positive resist material. Excellent resolution, plasma etching resistance, and high heat resistance of the resist pattern, and high resolution suitable for fine processing technology. |