Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c9444ac8fbe1a1904a6fd298779441c9 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 |
filingDate |
1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5de49d64a17489a3a00c058ccd920946 |
publicationDate |
1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H09268369-A |
titleOfInvention |
Sputtering film forming equipment |
abstract |
It is possible to form a film of good quality ITO or the like with a uniform film thickness on a flexible substrate by a stepping roll method. SOLUTION: A reciprocating motion is performed in parallel with the substrate surface by sandwiching an anode electrode arranged on one surface side of a stopped flexible substrate and a target on which a magnet is fixed. The speed of movement is high in the central part and low near the end where the direction of movement is reversed. Further, the anode electrode is formed in a square ring shape so as not to block the sputtered particles. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100751174-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111383901-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013160948-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019218581-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006131955-A |
priorityDate |
1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |