http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09268369-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c9444ac8fbe1a1904a6fd298779441c9
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203
filingDate 1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5de49d64a17489a3a00c058ccd920946
publicationDate 1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09268369-A
titleOfInvention Sputtering film forming equipment
abstract It is possible to form a film of good quality ITO or the like with a uniform film thickness on a flexible substrate by a stepping roll method. SOLUTION: A reciprocating motion is performed in parallel with the substrate surface by sandwiching an anode electrode arranged on one surface side of a stopped flexible substrate and a target on which a magnet is fixed. The speed of movement is high in the central part and low near the end where the direction of movement is reversed. Further, the anode electrode is formed in a square ring shape so as not to block the sputtered particles.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100751174-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111383901-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013160948-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019218581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006131955-A
priorityDate 1996-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 21.