http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09267574-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N3-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 1996-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dfca86da6bbb23baf011620d88a0bda http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_996bc266069be2cffb8b5e4732f7888d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d666c0e87f165ed69603be92968ab2e4 |
| publicationDate | 1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H09267574-A |
| titleOfInvention | Photosensitive lithographic printing plate |
| abstract | (57) [Abstract] [Problem] It is possible to suppress the generation of stains on non-image areas and fine spots at the time of printing restart without deteriorating printing durability, and further achieving both clear sensitivity and small dot reproducibility. The present invention relates to a positive photosensitive lithographic printing plate suitable for high-definition printing. SOLUTION: In a photosensitive lithographic printing plate comprising a roughened and anodized aluminum support provided with a photosensitive layer containing a photosensitive composition, a) by the roughening of the aluminum support The photosensitive lithographic printing plate is characterized in that the pits formed have an average opening diameter of 600 to 1000 nm, and b) the photosensitive composition contains a surface-active polysiloxane and an o-quinonediazide compound. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006184908-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4663515-B2 |
| priorityDate | 1996-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 430.