| abstract |
(57) [Abstract] [Problem] To develop a polyimide-based photosensitive resin composition that can be developed with an alkaline developer or an aqueous alkaline solution, and to form a pattern that has both excellent film physical properties and a safe and natural and human-friendly working environment. Providing a method. The composition includes (A) a polyamic acid compound having actinic radiation functional groups at both ends, (B) a photosensitizer having a photopolymerizable functional group, (C) a photopolymerization initiator, and (D) a solvent. A pattern forming method, which comprises applying a photosensitive resin composition onto a substrate to form a film, exposing the film to a pattern, and then developing the film with an alkaline developer or an alkaline aqueous solution. |